Intel Factory in Israel Suffers Second Dangerous Leak Days After Fatal Explosion

Just five days after a fatal explosion at Intel's factory in Kiryat Gat killed two workers, another hazardous materials incident has occurred at the facility. A leak of nitrogen trifluoride (NF3), a gas used in chip manufacturing, was reported recently. Fire and rescue services were dispatched to the scene, and there are currently no reports of injuries. The area where the incident took place had already been evacuated following last week's explosion.

It remains unclear what caused the current leak, whether it is a direct consequence of the previous malfunction, or its impact on the factory's operations. The incident follows a deadly explosion and fire at the same plant on Wednesday, October 14. Three workers were critically injured with burns, and two later died from their wounds.

Initial police investigations suggest the earlier explosion may have been caused by a malfunction in a gas cylinder during material transfer. Firefighters, hazardous materials teams, and representatives from the Ministry of Environmental Protection responded to that event. Nitrogen trifluoride was also involved in the previous incident; while not flammable, it is an oxidizer and can be dangerous if exposed. This gas is crucial in semiconductor manufacturing for cleaning production chambers and equipment.

The latest incident raises questions about the condition of the factory's infrastructure and the safety checks conducted since the fatal explosion. The investigation into the prior accident is ongoing, with no final conclusions yet released. Authorities are now working to determine if the new leak is connected to damage sustained by the gas supply system last week. The Kiryat Gat plant is a key production site for Intel, manufacturing chips using Intel 7 technology. No update has been provided on the current incident's effect on production lines or overall operations.